Nirasaki, Japan

Reisa Matsumoto

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Reisa Matsumoto. Retrieved from https://idiyas.com/inventor/reisa-matsumoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Reisa Matsumoto: Innovator in Plasma Processing Technology

Introduction

Reisa Matsumoto is a prominent inventor based in Nirasaki, Japan. She has made significant contributions to the field of plasma processing technology, particularly in the cleaning methods for microwave plasma processing apparatuses. Her innovative approach has garnered attention in the industry.

Latest Patents

Reisa Matsumoto holds a patent for a cleaning method that enhances the efficiency of microwave plasma processing apparatuses. This method involves adjusting the pressure to correspond with the size of the cleaning target part within the processing container. The process includes supplying a cleaning gas and utilizing plasma to perform the cleaning, ensuring optimal maintenance of the apparatus.

Career Highlights

Matsumoto is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. Her work has been instrumental in advancing cleaning technologies that are crucial for maintaining the performance of plasma processing equipment.

Collaborations

Throughout her career, Reisa has collaborated with notable colleagues such as Satoshi Itoh and Takafumi Nogami. These partnerships have contributed to her innovative work and the development of effective cleaning methods in the industry.

Conclusion

Reisa Matsumoto's contributions to plasma processing technology exemplify her dedication to innovation. Her patented cleaning method represents a significant advancement in the field, showcasing her expertise and commitment to improving industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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