Grubbenvorst, Netherlands

Reinier H Wieringa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Oce-Technologies B.v.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Reinier H Wieringa. Retrieved from https://idiyas.com/inventor/reinier-h-wieringa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Reinier H Wieringa: Innovator in Image-Forming Technology

Introduction

Reinier H Wieringa is a notable inventor based in Grubbenvorst, Netherlands. He has made significant contributions to the field of image-forming technologies, particularly through his innovative methods and techniques.

Latest Patents

Wieringa holds a patent for a "Method of making an endless image-forming medium." This invention involves creating an endless support from a strip of semi-crystalline material. The process includes bringing the ends of the strip together, fusing them, and post-crystallizing the fused ends. Prior to applying the image-forming layer, a portion of the support is stretched and heated above the glass transition temperature of the material.

Career Highlights

Wieringa is associated with Oce-Technologies B.V., a company known for its advancements in printing technology. His work has contributed to the development of innovative solutions in the imaging sector.

Collaborations

Throughout his career, Wieringa has collaborated with notable colleagues, including Mark Miedema and Robert N J Jacobs. These partnerships have fostered a creative environment that encourages innovation and technological advancement.

Conclusion

Reinier H Wieringa's contributions to image-forming technology exemplify the spirit of innovation. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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