The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2007

Filed:

Jan. 12, 2005
Applicants:

Mark Miedema, Velden, NL;

Reinier H. Wieringa, Grubbenvorst, NL;

Robert N. J. Jacobs, Maasbree, NL;

Robert Link, Munich, DE;

Inventors:

Mark Miedema, Velden, NL;

Reinier H. Wieringa, Grubbenvorst, NL;

Robert N. J. Jacobs, Maasbree, NL;

Robert Link, Munich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making an endless image-forming medium starting from a strip of semi-crystalline support material, which strip extends between a first and second end, wherein the ends of the strip are brought together and fused to form an endless support, and the fused ends are post-crystallized, wherein prior to the application of the image-forming layer to the support at least a portion of the support is stretched, and the stretched part of the support is heated to a temperature above the glass transition temperature of the support material.


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