Reiner Trinowitz

Title: Reiner Trinowitz: Innovator in Wafer Mark Configuration

Introduction

Reiner Trinowitz is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of lithography, particularly in the production of DRAMs. His innovative work focuses on improving the alignment and determination of relative positions in substrates during lithographic exposure.

Latest Patents

Trinowitz holds a patent for a mark configuration, wafer with at least one mark configuration, and a method of producing at least one mark configuration. This invention provides a mark configuration that allows for the alignment of at least two planes in relation to one another in a substrate. The mark structure includes at least one layer of definable thickness underneath the mark structure, which adjusts the physical position of the mark structure relative to a reference plane. This innovation ensures that mark structures exhibit good contrast regardless of design or process conditions.

Career Highlights

Reiner Trinowitz is associated with Infineon Technologies AG, where he has been instrumental in advancing technologies related to wafer production. His expertise in lithography and mark configurations has positioned him as a key player in the semiconductor industry.

Collaborations

Trinowitz has collaborated with notable colleagues such as Hans-Georg Fröhlich and Johannes Kowalewski. Their combined efforts have contributed to the development of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Reiner Trinowitz's contributions to wafer mark configurations highlight his role as an innovator in the semiconductor industry. His patent reflects a significant advancement in lithographic techniques, ensuring better alignment and positioning in substrate production.