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Years Active: 2019
Title: Reijiro Shimura: Innovator in Ferroelectric Film Technology
Introduction
Reijiro Shimura is a notable inventor based in Nomi, Japan. He has made significant contributions to the field of materials science, particularly in the development of ferroelectric films. His innovative approach has led to advancements that are crucial for various technological applications.
Latest Patents
Reijiro Shimura holds a patent for a method for forming PZT ferroelectric film. This invention involves several steps, including applying a liquid composition to create the film, drying the applied film, and irradiating it with UV rays in an oxygen-containing atmosphere. The process also includes a firing step to crystallize the precursor film, ensuring the ferroelectric film achieves a thickness of 150 nm or more. The careful control of temperature and the supply of ozone during UV irradiation are key aspects of this method.
Career Highlights
Throughout his career, Reijiro Shimura has worked with prestigious organizations, including the Japan Advanced Institute of Science and Technology and Mitsubishi Materials Corporation. His work in these institutions has allowed him to explore and develop innovative technologies that enhance the performance of ferroelectric materials.
Collaborations
Reijiro has collaborated with notable colleagues such as Yuki Tagashira and Yuzuru Takamura. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in the field of materials science.
Conclusion
Reijiro Shimura's contributions to the development of PZT ferroelectric films highlight his innovative spirit and dedication to advancing technology. His work continues to influence the field and pave the way for future innovations.