Company Filing History:
Years Active: 2008-2009
Title: Innovations by Rebecca A. Nickell
Introduction
Rebecca A. Nickell is a prominent inventor based in Phoenix, AZ, known for her contributions to the field of chemical mechanical polishing (CMP). With a total of 2 patents, she has made significant advancements in reducing metal dishing during the CMP process, which is crucial for the manufacturing of semiconductor devices.
Latest Patents
Rebecca's latest patents focus on methods for reducing metal dishing after CMP. One of her patents describes a protective barrier layer made of materials such as titanium or titanium nitride. This layer is designed to ensure that the removal during CMP is primarily mechanical rather than chemical. The method allows for the upper topological regions of the protective barrier to be removed first, exposing the tungsten beneath while protecting lower regions from chemical attack. This innovation results in a substantially planar CMP patterned tungsten that avoids dishing, even in large area structures like MOS capacitors.
Career Highlights
Rebecca A. Nickell is currently employed at STMicroelectronics GmbH, where she continues to develop innovative solutions in semiconductor manufacturing. Her work has been instrumental in enhancing the efficiency and effectiveness of CMP processes, contributing to the advancement of technology in the industry.
Collaborations
Throughout her career, Rebecca has collaborated with notable colleagues, including Charles R. Spinner III and Todd H. Gandy. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.
Conclusion
Rebecca A. Nickell's contributions to the field of semiconductor manufacturing through her innovative patents demonstrate her expertise and commitment to advancing technology. Her work continues to impact the industry positively, paving the way for future innovations.