This inventor holds 1 USPTO granted patent. Top assignee: Varian Semiconductor Equipment Associates, Inc.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: The Innovations of Raymond L. Pelletier
Introduction
Raymond L. Pelletier is an accomplished inventor based in Beverly, MA (US). He has made significant contributions to the field of ion beam technology. His innovative work has led to the development of a patent that enhances the precision of ion beam systems.
Latest Patents
Raymond L. Pelletier holds a patent for "Methods and apparatus for alignment of ion beam systems using beam current sensors." This invention involves sensing an ion beam with a beam current sensor that has a sensing aperture smaller than the cross-sectional dimension of the ion beam. The sensed ion beam current indicates the position of the ion beam relative to a desired path. If the sensed position differs from the desired path, adjustments can be made. This technology is particularly useful in ion implanters for calibration and alignment purposes. The beam current sensor can also determine the relationship between characteristics of the ion beam and system parameters necessary for directing the beam along the desired path. He has 1 patent to his name.
Career Highlights
Raymond L. Pelletier is associated with Varian Semiconductor Equipment Associates, Inc., where he applies his expertise in ion beam technology. His work has been instrumental in advancing the capabilities of ion beam systems.
Collaborations
Throughout his career, Pelletier has collaborated with notable colleagues, including Antonella Cucchetti and Leo Vincent Klos, Jr. These collaborations have contributed to the development of innovative solutions in the field.
Conclusion
Raymond L. Pelletier's contributions to ion beam technology exemplify the impact of innovation in scientific advancement. His patent reflects a commitment to enhancing the precision and effectiveness of ion beam systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile