Raymond L Degner

Title: The Innovations of Raymond L. Degner

Introduction

Raymond L. Degner is a notable inventor based in Los Altos, California. He has made significant contributions to the field of plasma processes, holding a total of 3 patents. His work primarily focuses on the development of advanced electrode assemblies for plasma reactors.

Latest Patents

One of his latest patents is for a composite electrode designed for plasma processes. This innovative electrode assembly is utilized in plasma reactors, such as those used for plasma etching or plasma-enhanced chemical vapor deposition. The assembly features an electrode plate with a support frame attached to one surface. The electrode plate is made from a substantially pure material that is compatible with the specific reactions occurring in the reactor. The support frame is constructed from a material that possesses desirable thermal, electrical, and structural characteristics. A ductile metallic bonding layer is used to bond the support frame to the electrode plate, ensuring effective thermal and electrical coupling while accommodating thermal expansion mismatches.

Career Highlights

Raymond L. Degner has built a successful career at Lam Research Corporation, where he has been instrumental in advancing plasma technology. His expertise in electrode design has contributed to the efficiency and effectiveness of various plasma processes.

Collaborations

Throughout his career, Degner has collaborated with talented individuals such as Eric H. Lenz and Christopher O. Lada. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Raymond L. Degner's contributions to plasma technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in plasma processes, showcasing the importance of innovation in technology.