Company Filing History:
Years Active: 2001-2002
Title: Innovations of Raymond K F Lam
Introduction
Raymond K F Lam is an accomplished inventor based in Park Ridge, NJ (US). He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. With a total of 3 patents to his name, Lam's work has had a notable impact on the industry.
Latest Patents
One of Lam's latest patents is for a nickel/vanadium sputtering target with ultra-low alpha emission. This innovative target is designed for depositing magnetic nickel and boasts high homogeneity and purity. The source materials used in its creation have alpha emissions of equal to or less than 10 counts/cm-hr, ensuring minimal interference in sensitive applications. Another significant patent involves the fabrication of clad hollow cathode magnetron sputter targets. This method allows for the creation of targets that are lighter and more cost-effective than traditional monolithic targets, enhancing the efficiency of material utilization.
Career Highlights
Raymond K F Lam is currently employed at Praxair S.T. Technology, Inc., where he continues to push the boundaries of innovation in sputtering technology. His expertise in materials science has positioned him as a key player in the development of advanced manufacturing processes.
Collaborations
Lam has collaborated with notable colleagues such as Tony Sica and Shailesh Kulkarni. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Raymond K F Lam's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His work continues to influence the industry and pave the way for future innovations.