Praxair S.t. Technology, Inc.

Raymond K F Lam

Tony Sica

Shailesh Kulkarni

Edward N Switzer

A nickel/vanadium sputter target for depositing magnetic nickel is provided having high homogeneity, high purity and an ultra-low level of alpha emission. Source materials having high purity and alpha emissions of equal or less than 10 counts/cm -hr are melted and cast under a vacuum and low pressure, hot or cold rolled, and heat treated to form a sputter target having an alpha emission of equal or less than 10 counts/cm -hr, and preferably less than 10 counts/cm -hr. From this target may be deposited a thin film of magnetic nickel having an alpha emission equal or less than 10 counts/cm -hr, preferably less than 10 counts/cm -hr and more preferably less than 10 counts/cm -hr.

Nickel/vanadium sputtering target with ultra-low alpha emission

A method is provided for forming clad hollow cathode magnetron sputter targets that are lighter in weight and/or less expensive than monolithic targets. A plate of sputter target material is bonded to a sheet of cladding material that is lighter in weight and/or less expensive than the sputter target material. This clad target assembly is then formed into a hollow cathode magnetron sputter target, such as by deep drawing. The clad hollow cathode magnetron further provides greater percent utilization of sputter target material than monolithic targets.

Fabrication of clad hollow cathode magnetron sputter targets

An automated heat treatment controller consistently controls heat treating a metallic target in a furnace according to a heat treatment recipe including a cycle temperature and a cycle exposure time. The automated heat treatment controller includes an operator interface for prompting an operator to load or remove a heat treated target. The controller further provides for commanding furnace door locks and for monitoring system performance. An automated heat treatment furnace method includes the steps of pre-heating the furnace, prompting the user to load the material, reheating the furnace to heat treatment parameters, controlling the exposure time and temperature, and prompting the removal of the material.

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Park Ridge, NJ, United States of America

Raymond K F Lam