The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2002
Filed:
Mar. 31, 1999
Raymond K. F. Lam, Park Ridge, NJ (US);
Tony Sica, Mt. Vernon, NY (US);
Praxair S.T. Technology, Inc., North Haven, CT (US);
Abstract
A nickel/vanadium sputter target for depositing magnetic nickel is provided having high homogeneity, high purity and an ultra-low level of alpha emission. Source materials having high purity and alpha emissions of equal or less than 10 counts/cm -hr are melted and cast under a vacuum and low pressure, hot or cold rolled, and heat treated to form a sputter target having an alpha emission of equal or less than 10 counts/cm -hr, and preferably less than 10 counts/cm -hr. From this target may be deposited a thin film of magnetic nickel having an alpha emission equal or less than 10 counts/cm -hr, preferably less than 10 counts/cm -hr and more preferably less than 10 counts/cm -hr.