Plainsboro, NJ, United States of America

Raymond J Menna


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 49(Granted Patents)


Location History:

  • Plainsboro, NJ (US) (1983)
  • Jenkintown, PA (US) (1984)

Company Filing History:


Years Active: 1983-1984

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2 patents (USPTO):Explore Patents

Title: Innovations of Raymond J Menna

Introduction

Raymond J Menna is a notable inventor based in Plainsboro, NJ (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

One of his latest patents is a method for fabricating via connectors through semiconductor wafers. This method involves forming an adherent metal layer on the first surface of a semiconductor wafer, which may contain electronic components. The process includes laser drilling via holes and applying a photoresist layer to create passage holes aligned with the drilled apertures. The metal layer is then used in an electroforming apparatus to create via connectors. Another significant patent is the hybrid power divider/combiner circuit. This invention features a 0-degree and 180-degree hybrid power divider/combiner that utilizes a first quadrature hybrid and two additional quadrature hybrids arranged in tandem. This design allows for the production of two signals of reduced amplitude that can be either in phase or of opposed phase, depending on the input signal.

Career Highlights

Raymond J Menna has had a distinguished career at RCA Inc., where he has applied his expertise in semiconductor technology. His work has contributed to advancements in electronic components and circuit design.

Collaborations

Throughout his career, Menna has collaborated with notable colleagues, including James C Whartenby and Richard N Brown. These collaborations have further enriched his contributions to the field.

Conclusion

Raymond J Menna's innovative patents and career at RCA Inc. highlight his significant impact on semiconductor technology. His work continues to influence advancements in the industry.

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