Amherst, NH, United States of America

Raymond J Doww, Iii

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond J Doww, Iii. Retrieved from https://idiyas.com/inventor/raymond-j-doww-iii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations of Raymond J Doww, III

Introduction

Raymond J Doww, III is an accomplished inventor based in Amherst, NH (US). He has made significant contributions to the field of supercritical fluid cleaning systems. His innovative approach has led to the development of a unique method and apparatus for the rotation of workpieces in supercritical fluid solutions.

Latest Patents

Raymond holds a patent for a method and apparatus designed for the rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues, and particles. This supercritical fluid cleaning system utilizes process fluid to operate rotary motors within a chamber that features fluid bearings and fluid load levitation. The system is designed to enhance the cleaning process by incorporating rotating speed and direction sensors, as well as a home position locator for effective motor control. The impellers within the system further agitate the fluid, resulting in faster processing and greater uniformity of supercritical fluid components, which increases mass transfer to the processed surface.

Career Highlights

Throughout his career, Raymond has focused on developing advanced cleaning technologies that minimize contamination. His innovative designs include centrifugal operated clips and cassettes that securely hold wafers and impellers. The non-contact, fluid-operated rotating mechanisms he has developed significantly reduce the risk of contamination during the cleaning process. The physical, rotational, and shear effects are enhanced through centrifugal forces, which can effectively separate localized deposits or molecular products from the surface being processed.

Collaborations

Raymond has collaborated with notable professionals in his field, including Keith Randal Pope and David J Mount. Their combined expertise has contributed to the advancement of technologies in supercritical fluid applications.

Conclusion

Raymond J Doww, III is a pioneering inventor whose work in supercritical fluid cleaning systems has made a lasting impact on the industry. His innovative methods and collaborative efforts continue to push the boundaries of technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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