This inventor holds 1 USPTO granted patent. Top assignee: Sigma Space Corporation. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: The Innovative Contributions of Raymond George Ohl, IV
Introduction
Raymond George Ohl, IV is a notable inventor based in Dayton, MD (US). He has made significant contributions to the field of metrology through his innovative patent. His work exemplifies the intersection of technology and practical applications, showcasing the importance of precision in measurements.
Latest Patents
Ohl holds a patent for a method titled "Laser radar through the window (LRTW) coordinate correction method." This invention addresses the challenges of measuring points of interest through stratified media. The method involves ray-tracing at least one ray launched from a metrology instrument towards an apparent point of interest. It calculates the path length of the ray through the stratified medium and determines the true coordinates of the point of interest using the path length and the direction of propagation of the ray. This innovative approach enhances the accuracy of measurements in complex environments.
Career Highlights
Raymond George Ohl, IV is associated with Sigma Space Corporation, where he applies his expertise in metrology and innovative technologies. His work at the company reflects a commitment to advancing measurement techniques and improving the reliability of data collected in various applications.
Collaborations
Ohl has collaborated with notable colleagues, including Joseph Ethan Hayden and Theodore John Hadjimichael. These partnerships highlight the collaborative nature of innovation and the importance of teamwork in achieving technological advancements.
Conclusion
Raymond George Ohl, IV's contributions to the field of metrology through his innovative patent demonstrate the critical role of inventors in enhancing measurement accuracy. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
