The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Jul. 18, 2013
Applicants:

Joseph Ethan Hayden, Ellicot City, MD (US);

David Albert Kubalak, Wheaton, MD (US);

Theodore John Hadjimichael, Washington, DC (US);

Bente Hoffmann Eegholm, Columbia, MD (US);

Raymond George Ohl, Iv, Dayton, MD (US);

Randal Crawford Telfer, Baltimore, MD (US);

Phillip Coulter, Sewell, NJ (US);

Inventors:

Joseph Ethan Hayden, Ellicot City, MD (US);

David Albert Kubalak, Wheaton, MD (US);

Theodore John Hadjimichael, Washington, DC (US);

Bente Hoffmann Eegholm, Columbia, MD (US);

Raymond George Ohl, IV, Dayton, MD (US);

Randal Crawford Telfer, Baltimore, MD (US);

Phillip Coulter, Sewell, NJ (US);

Assignee:

Sigma Space Corporation, Lanham, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01C 25/00 (2006.01);
U.S. Cl.
CPC ...
G01C 25/00 (2013.01);
Abstract

A method for corrections of measurements of points of interests measured by beams of radiation propagating through stratified media including performance of ray-tracing of at least one ray lunched from a metrology instrument in a direction of an apparent point of interest, calculation a path length of the ray through stratified medium, and determination of coordinates of true position of the point interest using the at least one path length and the direction of propagation of the ray.


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