Company Filing History:
Years Active: 1980-1991
Title: The Innovative Contributions of Raymond F. Reithel
Introduction
Raymond F. Reithel is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photoresist technology, holding a total of 6 patents. His work has been instrumental in advancing imaging technologies, particularly in the development of materials used in solid-state color image sensing devices.
Latest Patents
Among his latest patents is a photoresist dichromate composition containing gelatin-coated particles. This negative-working photoresist composition comprises dye-loaded or dye-precursor-loaded polymeric particles that are individually covered with a layer of gelatin, which is covalently bonded to the particles. This innovative composition is particularly useful in the preparation of continuous tone dyed imaging elements, such as color filter arrays. Another significant patent is the negative-working dyeable photoresist composition, which also plays a crucial role in imaging technology.
Career Highlights
Raymond F. Reithel has spent a considerable part of his career at Eastman Kodak Company, where he has contributed to various projects and innovations. His expertise in photoresist technology has positioned him as a key figure in the development of advanced imaging materials.
Collaborations
Throughout his career, Reithel has collaborated with several talented individuals, including Richard C. Sutton and Pranab Bagchi. These collaborations have fostered a creative environment that has led to numerous advancements in their respective fields.
Conclusion
Raymond F. Reithel's contributions to the field of photoresist technology are noteworthy and impactful. His innovative patents and collaborations have significantly advanced imaging technologies, making him a respected figure in the industry.