The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1991
Filed:
Mar. 19, 1990
Applicant:
Inventors:
Pranab Bagchi, Webster, NY (US);
Raymond F Reithel, Rochester, NY (US);
Tsang J Chen, Rochester, NY (US);
Steven Evans, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430289 ; 430-7 ; 430213 ; 430238 ; 430245 ; 430320 ; 430271 ; 430274 ;
Abstract
A negative-working photoresist composition comprising, in admixture, (a) dye-loaded or dye-precursor-loaded polymeric particles individually covered with a layer of gelatin that is covalently bonded thereto and (b) a radiation-sensitive dichromate is useful in the preparation of continuous tone dyed imaging elements such as color filter arrays for use in solid state color image sensing devices.