Round Rock, TX, United States of America

Raymond Dewine Heistand, Ii

USPTO Granted Patents = 19 

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 86(Granted Patents)


Company Filing History:


Years Active: 2005-2025

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19 patents (USPTO):Explore Patents

Title: **Inventor Spotlight: Raymond Dewine Heistand, II**

Introduction

Raymond Dewine Heistand, II is a distinguished inventor based in Round Rock, Texas. With a remarkable portfolio of 18 patents, Heistand has made a significant impact in the field of technology, particularly in the development of innovative apparatuses for expansion device retention and mechanisms within server racks.

Latest Patents

Heistand's recent patents showcase his ingenuity and focus on enhancing technological functionality. One of his notable inventions is an "Apparatus for Expansion Device Retention." This innovative apparatus implements retention mechanisms that can be temporarily fastened to expansion slots, allowing for a reduction or elimination of permanent modification to printed circuit boards. Among these inventive solutions is an attachable hockey stick designed for expansion devices lacking this feature, which engages with retention mechanisms to secure devices during shock events.

Another of his inventions is the "System and Method for Mechanical Release of Sleds in Enclosures." This design enhances server efficiency by providing front panel access to multiple release mechanisms for hot and cold swaps. The hot swap mechanism ejections allow for operational continuity while retaining electrical power. In contrast, the cold swap mechanism ensures the sled is safely released while disconnecting the electrical connection. This dual-access design prevents unauthorized overlapping of operations, significantly improving safety and efficiency in server management.

Career Highlights

Raymond Heistand has been a key contributor at Dell Products Inc., where he has applied his inventive skill set to developing cutting-edge technologies. His dedication to innovation has placed him at the forefront of product advancements in the tech industry.

Collaborations

Throughout his career, Heistand has worked alongside talented individuals in the industry, including colleagues Sandor Tibor Farkas and Bhyrav M Mutnury. Their collaborations have further propelled the advancements achieved within their projects at Dell Products Inc.

Conclusion

Raymond Dewine Heistand, II’s contributions to technology through his patents reflect his innovative spirit and dedication to improving efficiency and functionality in tech systems. His work not only enhances operational capabilities but also showcases the potential for future advancements in the field, making him a prominent figure in the world of invention.

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