Ray A Hill

Title: Ray A Hill: Innovator in Semiconductor Fabrication

Introduction

Ray A Hill is a notable inventor based in Vancouver, WA (US), recognized for his contributions to semiconductor fabrication processes. He has developed innovative techniques that enhance the efficiency and effectiveness of memory device manufacturing.

Latest Patents

One of Hill's significant patents is titled "Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications." This patent describes a dry etch process that selectively etches silicon nitride from conductive oxide materials, which is crucial for semiconductor fabrication. By incorporating an oxidant in the etch gas mixture, the etch rate for silicon nitride can be increased while simultaneously reducing the etch rate for the conductive oxide. This advancement results in improved etch selectivity, making the process well-suited for fabricating ferroelectric memory devices that utilize a conductive oxide/ferroelectric interface with silicon nitride as the encapsulated material.

Career Highlights

Ray A Hill is currently employed at Sharp Laboratories of America, Inc., where he continues to innovate in the field of semiconductor technology. His work has significantly impacted the development of advanced memory devices, showcasing his expertise and commitment to the industry.

Collaborations

Hill has collaborated with notable colleagues, including Tingkai Li and Sheng Teng Hsu, contributing to various projects that enhance semiconductor fabrication techniques.

Conclusion

Ray A Hill's contributions to the field of semiconductor fabrication, particularly through his patent on selective etching processes, highlight his role as an influential inventor. His work continues to shape the future of memory device technology.