This inventor holds 4 USPTO granted patents. Top assignee: Research Triangle Institute. Active years: 1993-1995.
Company Filing History:
Years Active: 1993-1995
Title: Innovations of Ravindran Periasamy
Introduction
Ravindran Periasamy is an accomplished inventor based in Cary, NC (US). He has made significant contributions to the field of substrate processing and particle control, holding a total of 4 patents. His work focuses on innovative methods and devices that enhance the efficiency and effectiveness of various processes.
Latest Patents
One of his latest patents is titled "Method and apparatus for protecting a substrate surface from contamination." This invention involves an apparatus designed for processing a substrate surface within a process chamber. During the chemical or physical alteration of the substrate, a laser beam is projected inside the chamber along a trajectory that does not contact the substrate surface. This method captures particles through the photophoretic effect, preventing contamination of the substrate.
Another notable patent is the "Device for focusing particles suspended in a gas stream." This device controls the motion of particles in a gas stream using a pipe through which the gas flows. It incorporates a source of AC voltage, a source of DC voltage, and multiple electrode sets positioned within the pipe. These electrodes generate an inhomogeneous electric field that concentrates the particles into a narrow axial region, enhancing the efficiency of the process.
Career Highlights
Ravindran Periasamy is currently employed at the Research Triangle Institute, where he continues to innovate and develop new technologies. His work has had a significant impact on the field, particularly in the areas of substrate processing and particle manipulation.
Collaborations
He has collaborated with notable colleagues, including Robert P Donovan and David S Ensor, contributing to various projects and advancements in their respective fields.
Conclusion
Ravindran Periasamy's innovative patents and contributions to technology demonstrate his expertise and commitment to advancing the field of substrate processing and particle control. His work continues to influence the industry and inspire future innovations.