The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 1993

Filed:

Dec. 23, 1991
Applicant:
Inventors:

Robert P Donovan, Durham, NC (US);

Ravindran Periasamy, Cary, NC (US);

Anthony C Clayton, Rougemont, NC (US);

David S Ensor, Chapel Hill, NC (US);

Assignee:

Research Triangle Institute, Research Triangle Park, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427483 ; 118 501 ; 118627 ; 118629 ; 239-3 ; 239-4 ; 2391022 ; 239690 ; 427485 ; 427510 ; 430935 ;
Abstract

An apparatus and method including a droplet coating generator for generating a stream of electrically charged coating droplets within an evacuable chamber towards a substrate positioned within the evacuable chamber. A piezoelectric vibrator and orifice plate coupled thereto generate the stream of coating droplets. The coating droplets are urged to move in a sweeping motion across the substrate by at least one pair of opposing spaced apart electrodes powered by an electrical power supply. A uniform coating is thus produced while the evacuable chamber is maintained at subatmospheric pressure as required during typical semiconductor processing. Multiple applications of a photoresist coating may be applied by the coating apparatus without requiring that the evacuable chamber be repeatedly vented and pumped down to subatmospheric pressure.


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