Danbury, CT, United States of America

Ravi K Dasaka


Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016-2020

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

As a specialist in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can provide you with a well-rounded article about the accomplished inventor Ravi K Dasaka.

Title: The Inventive Mind of Ravi K Dasaka

Introduction:

Ravi K Dasaka, a talented inventor hailing from Danbury, CT, US, has made significant contributions to the field of technology through his innovative creations and patented inventions.

Latest Patents:

Among his impressive portfolio of patents, one notable invention is the "High Selectivity Nitride Removal Process Based on Selective Polymer Deposition." This groundbreaking process involves the removal of a silicon nitride cap on a gate stack using a unique fluorohydrocarbon-containing plasma, ensuring minimal damage to surrounding regions.

Career Highlights:

Having secured a total of 5 patents, Ravi K Dasaka has demonstrated his exceptional skills and expertise in the realm of technological advancements. His inventive solutions have advanced the semiconductor industry, particularly in the field of nitride removal processes.

Collaborations:

Throughout his career, Ravi K Dasaka has collaborated with renowned companies such as IBM (International Business Machines Corporation) and Zeon Corporation. His innovative spirit has inspired and influenced coworkers like Sebastian Ulrich Engelmann and Nicholas C M Fuller.

Conclusion:

In conclusion, Ravi K Dasaka's contributions to the world of technology and innovation are truly commendable. His patents and collaborative efforts with esteemed organizations reflect his dedication to pushing the boundaries of technological advancement. Ravi K Dasaka stands as a shining example of an inventive mind shaping the future of technology.

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