Company Filing History:
Years Active: 1996-2025
Title: Innovations of Randy L. Heckman
Introduction
Randy L. Heckman is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of plasma technology, holding a total of 9 patents. His work focuses on advancing methods and apparatuses that enhance the control and delivery of power in inductively coupled plasma systems.
Latest Patents
One of his latest patents is titled "Apparatus to control ion energy." This invention describes an apparatus and method to produce a waveform that includes a first node to couple to a substrate support and a power supply coupled to a second node. The power supply is configured to provide a DC voltage to set an ion energy at the surface of the substrate. Additionally, the apparatus features a first switch that couples the second node to the first node, allowing a first voltage to be applied at the first node when the switch is closed. A second switch couples a third node to the first node, enabling a second voltage to be applied at the first node, which effectuates a negative voltage at the surface of the substrate.
Another significant patent is "Power delivery to a plasma via inductive coupling." This invention discloses inductively coupled plasma (ICP) RF power delivery systems that include at least two ICP coils. At least one of the ICP coils is directly driven by an RF resonant power amplifier, which comprises a resonant tank including the ICP coil. A controller is designed to manage the power into the direct-driven ICP coil by varying a corresponding DC voltage source and simultaneously adjusting the operating frequency into the ICP coil.
Career Highlights
Randy L. Heckman is currently employed at Advanced Energy Industries, Inc., where he continues to innovate in the field of plasma technology. His work has been instrumental in developing advanced systems that improve the efficiency and effectiveness of power delivery in various applications.
Collaborations
He has collaborated with notable coworkers such as Victor Brouk and Daniel John Hoffman, contributing to a dynamic team focused on pushing the boundaries of technology in their field.
Conclusion
Randy L. Heckman's contributions to plasma technology through his innovative patents and collaborative efforts highlight his significant role in advancing this critical area of research. His work continues to influence the industry and pave the way for future innovations.