Austin, TX, United States of America

Randy L German


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 155(Granted Patents)


Company Filing History:


Years Active: 1992-1998

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3 patents (USPTO):Explore Patents

Title: Innovations of Randy L German

Introduction

Randy L German is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of microelectronics, holding a total of 3 patents. His work focuses on advanced methods for fabricating metallization on dielectric substrates and developing compliant electrically connective bumps for integrated circuit devices.

Latest Patents

One of his latest patents is titled "Selective patterning of metallization on a dielectric substrate." This patent discloses a method for selectively fabricating metallization on a dielectric substrate. The process involves sputtering a seed layer on a polymer dielectric, applying a patterned photoresist mask, etching exposed portions of the seed layer, stripping the photoresist, and depositing copper through electroless plating on the unetched seed layer. This innovative approach allows for the formation of well-adhering high-density copper lines without exposing the photoresist to the electroless bath.

Another significant patent by Randy is "Compliant electrically connective bumps for an adhesive flip chip." This invention details methods for forming compliant electrically connection bumps for an adhesive flip chip integrated circuit device. The process includes forming polymer bumps on a substrate or integrated circuit die, coating these bumps with a metallization layer, and involves steps such as coating a polymer material, curing it, and etching the bump pattern. The overcoating step includes electrolessly plating a ductile metal, such as gold, on the polymer bump.

Career Highlights

Randy L German is associated with the Microelectronics and Computer Technology Corporation, where he has been instrumental in advancing microelectronic technologies. His innovative approaches have contributed to the development of new methods and materials in the field.

Collaborations

Randy has collaborated with notable coworkers, including Charles W Lin and Ernest R Nolan. Their combined expertise has fostered advancements in microelectronics and contributed to the success of their projects.

Conclusion

Randy L German's contributions to the field of microelectronics through his patents and innovative methods have made a significant impact. His work continues to influence the development of advanced technologies in the industry.

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