The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 1992

Filed:

Jun. 19, 1991
Applicant:
Inventors:

Charles W Lin, San Antonio, TX (US);

Randy L German, Austin, TX (US);

Ian Y Yee, Austin, TX (US);

David M Sigmond, Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B29C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156627 ; 156644 ; 156655 ; 156656 ; 1566591 ; 156668 ; 156902 ; 427 10 ; 427 97 ; 427 98 ; 427307 ; 437230 ;
Abstract

A method for detecting the completion of electrolessly depositing metal into a via. The method includes providing a non-autocatalytic detection mask with an opening over a via containing an autocatalytic material, electrolessly depositing a conductive metal into the via which fails to plate to the mask, and continuing the deposition until metal in the via contacts the mask, at which time the electrochemical potential of the mask changes and the metal plates to and covers the entire mask. The completion of the electroless via fill can be detected by changes in both the appearance and electrochemical potential of the mask.


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