Company Filing History:
Years Active: 2005-2009
Title: The Innovations of Randhir P Singh Thakur
Introduction
Randhir P Singh Thakur is an accomplished inventor based in San Jose, CA, with a strong portfolio of two patents in the field of advanced materials technology. His work has significantly contributed to innovations in semiconductor manufacturing processes, enhancing the efficiency and effectiveness of modern production techniques.
Latest Patents
Thakur's latest patents include advancements related to silicon nitride films and their formation processes. The first patent details a silicon nitride film with stress control, describing an assembly comprising a multilayer nitride stack with nitride etch stop layers that are meticulously formed using a specialized film forming process. This innovative design involves placing a substrate in a single wafer deposition chamber, where thermally shocking the substrate precedes the deposition of the nitride layers. The deployment of both a first and a second nitride etch stop layer over the substrate represents a significant leap in material engineering.
The second patent focuses on methods for forming silicon comprising films using hexachlorodisilane (HCD) in a single-wafer deposition chamber. This invention describes a process where a silicon film is grown on a substrate, utilizing HCD as a reactant species under a controlled pressure setting between 10 Torr and 350 Torr. These advancements showcase Thakur's depth of knowledge and expertise in his field.
Career Highlights
Thakur is currently associated with Applied Materials, Inc., a leading company specializing in materials engineering solutions for the semiconductor sector. His role involves pioneering research and development that drives the company’s innovations forward. His contributions have not only benefitted the company but have also had a lasting impact on the industry at large.
Collaborations
Throughout his career, Thakur has collaborated with notable co-workers, including R Suryanarayanan Iyer and Yuji Maeda. These partnerships underscore the collaborative nature of innovation in the high-tech industry, where teamwork and shared expertise contribute to groundbreaking inventions.
Conclusion
Randhir P Singh Thakur's contributions to the field of semiconductor materials have set a new benchmark for innovation. With his advancements in silicon nitride films and their fabrication methods, he exemplifies the essence of what it means to be an inventor in today’s fast-paced technological landscape. His work continues to inspire future generations of inventors and researchers alike.