Boise, ID, United States of America

Randall W Chance

This inventor holds 2 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Randall W Chance. Retrieved from https://idiyas.com/inventor/randall-w-chance

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Randall W Chance

Introduction: Randall W Chance, a pioneering inventor based in Boise, ID (US), has made significant contributions to the world of innovations with his creative mind and dedication to progress.

Latest Patents: Randall W Chance holds several patents in various fields, including renewable energy technologies, advanced materials, and consumer electronics. His most recent patent involves a groundbreaking design for a solar-powered device that enhances energy efficiency in residential settings.

Career Highlights: Throughout his illustrious career, Randall W Chance has been recognized for his groundbreaking inventions that have revolutionized industries. His work in developing sustainable solutions for environmental challenges has earned him prestigious awards and accolades.

Collaborations: Randall W Chance has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His partnerships have resulted in successful commercialization of his innovative ideas, benefiting society as a whole.

Conclusion: Randall W Chance's passion for innovation and commitment to creating a better future through his inventions make him a true visionary in the world of technology. His relentless pursuit of excellence continues to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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