Gan Yavne, Israel

Ran Feldesh

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ran Feldesh

Introduction

Ran Feldesh is an accomplished inventor based in Gan Yavne, Israel. He is known for his significant contributions to semiconductor metallurgy, particularly in the development of gold-free contacts that are compatible with CMOS technology. His innovative approach has the potential to enhance the efficiency and cost-effectiveness of semiconductor manufacturing.

Latest Patents

Feldesh holds a patent for his invention titled "CMOS-compatible gold-free contacts." This patent describes a semiconductor metallurgy that includes a specific ratio of germanium and palladium. This unique combination provides low contact resistance to both n-type and p-type materials. The metallurgy allows for a contact that does not include gold, making it suitable for mass-production CMOS techniques. The desired ratio of germanium and palladium can be achieved by stacking layers of the materials and annealing the stack, or by simultaneously depositing the germanium and palladium on the substrate where the contact is to be manufactured.

Career Highlights

Throughout his career, Ran Feldesh has worked with prominent organizations, including Intel Corporation and the University of California. His experience in these institutions has allowed him to refine his expertise in semiconductor technology and contribute to groundbreaking advancements in the field.

Collaborations

Feldesh has collaborated with notable professionals in the industry, including Siddharth Jain and John E. Bowers. These collaborations have further enriched his work and have led to significant developments in semiconductor metallurgy.

Conclusion

Ran Feldesh's innovative work in semiconductor metallurgy, particularly with his gold-free contacts, showcases his commitment to advancing technology in the field. His contributions have the potential to revolutionize semiconductor manufacturing processes and improve efficiency in the industry.

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