Company Filing History:
Years Active: 2007-2010
Title: Ralph Schlief: Innovator in Photolithography Mask Technology
Introduction
Ralph Schlief is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of photolithography, particularly in the calibration and optimization of two-dimensional feature models. With a total of 2 patents, his work has advanced the technology used in semiconductor manufacturing.
Latest Patents
One of Ralph Schlief's latest patents is a method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. This method includes several steps: defining a set of calibration patterns represented in a data format, printing these patterns on a substrate, and determining contour patterns corresponding to the calibration patterns imaged on the substrate. Additionally, it involves generating a system pseudo-intensity function to approximate the imaging performance of the imaging system, determining a second set of contour patterns, and comparing both sets to adjust the system pseudo-intensity function. The ultimate goal is to modify the mask for optical proximity correction.
Career Highlights
Ralph Schlief is currently employed at ASML Masktools B.V., where he continues to innovate in the field of photolithography. His expertise in the calibration and optimization of imaging systems has positioned him as a key player in the development of advanced semiconductor manufacturing technologies.
Collaborations
Ralph has collaborated with notable colleagues such as Thomas Laidig and Jang Fung Chen. Their combined efforts contribute to the ongoing advancements in photolithography and semiconductor technologies.
Conclusion
Ralph Schlief's contributions to the field of photolithography through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the semiconductor industry and drive technological advancements.