Munich, Germany

Ralf Mueller

This inventor holds 1 USPTO granted patent. Top assignee: Jenoptik Optical Systems Gmbh. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Mueller. Retrieved from https://idiyas.com/inventor/ralf-mueller-rknts9bg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Ralf Mueller - Innovator in Radiation Measurement Technology

Introduction

Ralf Mueller is a notable inventor based in Munich, Germany. He has made significant contributions to the field of optical systems, particularly in the measurement of power density distributions of radiation sources. His innovative approach has led to the development of a unique device that enhances the accuracy of radiation measurements.

Latest Patents

Ralf Mueller holds a patent for a "Device for measuring a power density distribution of a radiation source." This device includes a radiation source that emits a light beam in a specific direction. It features a substrate positioned downstream of the radiation source, which has distinct regions designed to separate the light beam into different orders of diffraction. A detector unit measures the intensity of the first order of diffraction, allowing for the derivation of a power density distribution.

Career Highlights

Ralf Mueller is associated with Jenoptik Optical Systems GmbH, where he applies his expertise in optical technologies. His work focuses on advancing measurement techniques that are crucial for various applications in the field of optics.

Collaborations

Ralf has collaborated with talented professionals such as Tobias Gnausch and Meik Panitz. Their combined efforts contribute to the innovative projects at Jenoptik Optical Systems GmbH.

Conclusion

Ralf Mueller's contributions to radiation measurement technology exemplify the impact of innovative thinking in the field of optics. His patent and collaborative efforts continue to influence advancements in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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