Hamburg, Germany

Ralf Hilgers


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 63(Granted Patents)


Location History:

  • Aalen, DE (2001 - 2002)
  • Hamburg, DE (2007)

Company Filing History:


Years Active: 2001-2007

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3 patents (USPTO):Explore Patents

Title: Ralf Hilgers: Innovator in Optical Technology

Introduction

Ralf Hilgers is a prominent inventor based in Hamburg, Germany. He has made significant contributions to the field of optical technology, holding a total of 3 patents. His work focuses on advancements in microlithography and optical arrangements, showcasing his expertise and innovative spirit.

Latest Patents

Ralf Hilgers' latest patents include an "Optical arrangement and projection exposure system for microlithography with passive thermal compensation." This invention features an optical arrangement that includes a light source and an optical element fastened in a mount. The light source emits radiation, and the optical element is affected by heat that lacks symmetry corresponding to its shape. A connecting structure is provided to ensure a more uniform temperature distribution within the optical element.

Another notable patent is the "Assembly comprising an optical element and a mount." This assembly consists of a mount and an optical element connected via elastic connecting elements. The connecting elements include a membrane-like joining element that connects to the mount or intermediate element, ensuring a rigid, moment-transferring connection to the optical element.

Career Highlights

Throughout his career, Ralf Hilgers has worked with esteemed organizations such as Carl Zeiss Stiftung and Carl Zeiss SMT AG. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking innovations in optical technology.

Collaborations

Ralf has collaborated with notable professionals in the field, including Michael Trunz and Bernhard Gellrich. These partnerships have further enhanced his work and contributed to the development of advanced optical systems.

Conclusion

Ralf Hilgers stands out as a key figure in the realm of optical technology, with a focus on microlithography and innovative optical arrangements. His patents reflect his commitment to advancing the field and improving the efficiency of optical systems.

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