Carl-zeiss-stiftung

Carl-zeiss-smt Ag

Ralf Hilgers

Michael Trunz

Bernhard Gellrich

Christian Wagner

Erich Merz

Michael M&uuml;hlbeyer

An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.

Optical arrangement and projection exposure system for microlithography with passive thermal compensation

An assembly is provided with a mount ( )and an optical element ( ). The optical element ( ) is connected via elastic connecting elements directly or via one or more intermediate elements to the mount ( ). The connecting elements have at least one membrane-like joining element ( ), which is connected in the outer region to the mount ( ) or to the intermediate element and in the inner region is connected via a rigid, moment-transferring connection ( ) to the optical element ( ).

Assembly comprising an optical element and a mount

An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.

Growing community of inventors

Hamburg, Germany

Ralf Hilgers