Ralf Gehrke

Title: Innovations by Inventor Ralf Gehrke in the Field of Metrology

Introduction

Ralf Gehrke, an esteemed inventor based in Aalen, Germany, has made significant contributions to the field of metrology through his innovative patents. With a total of three patents to his name, Gehrke's work focuses on enhancing the functionality and accuracy of metrology systems.

Latest Patents

One of Gehrke's latest inventions is a "Metrology system having an EUV optical unit." This invention features an EUV greyscale filter that has a membrane capable of being at least partially transmissive in regions for EUV light, specifically in the wavelength range of 5 nm to 30 nm. The interaction with a whole beam of EUV light in the operational position of the greyscale filter provides a metrology system with extended application possibilities, highlighting the advancement in accuracy and functionality.

Another notable patent is the "Method for predicting at least one illumination parameter for evaluating an illumination setting." This method involves measuring illumination parameters at various calibration settings and determining correction terms for prediction values based on the measured data. It allows for predicting illumination parameters of settings not included in the calibration set, further enhancing the precision of projection exposure apparatus for object fields.

Career Highlights

Ralf Gehrke has been instrumental in his role at Carl Zeiss SMT GmbH, where he continues to push the boundaries of optical technology. His work in metrology systems and related technologies underscores his expertise and innovative thinking in a highly specialized field.

Collaborations

Throughout his career, Gehrke has collaborated with notable colleagues such as Christoph Hennerkes and Wolfgang Hoegele. These partnerships have facilitated the exchange of ideas and further innovation in their respective projects and inventions.

Conclusion

In conclusion, Ralf Gehrke's contributions as an inventor in the field of metrology showcase his excellence and dedication to innovation. His latest patents reflect a strong commitment to advancing technology in optical systems, and his work continues to influence the industry positively.