Offenbach, Germany

Ralf Degenhardt

This inventor holds 2 USPTO granted patents. Top assignees: Carl-Zeiss-Stiftung, U.S. Philips Corporation. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Degenhardt. Retrieved from https://idiyas.com/inventor/ralf-degenhardt-gmh4pj25

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 49(Granted Patents)


Location History:

  • Offenbach, DE (1994)
  • Offenbach/M., DE (1994)

Company Filing History:


Years Active: 1994

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2 patents (USPTO):Explore Patents

Title: Ralf Degenhardt: Innovator in Electron Beam Technology

Introduction

Ralf Degenhardt is a notable inventor based in Offenbach, Germany. He has made significant contributions to the field of electron beam technology, holding 2 patents that showcase his innovative approach to imaging systems and spectrometric measurements.

Latest Patents

Degenhardt's latest patents include an electron beam apparatus and an imaging system for charged particles. The electron beam apparatus features an energy selective device that allows for spectrometric measurements alongside imaging. This device is designed with its main electron beam trajectory outside the optical axis, which effectively reduces the overall length of the apparatus. The energy selective device's double symmetry maximizes energy dispersion in a central plane, facilitating the introduction of a selective slit and compensating for optical aberrations.

The imaging system for charged particles incorporates a correction unit that enhances the performance of an objective lens. This system includes a beam deflector and a mirror that reflects the incoming particle beam. The first symmetry plane of the deflector is imaged in the mirror, achieving a 1:1 imaging scale in a second symmetry plane. This high symmetry allows for the cancellation of second-order aberrations after multiple passthroughs, while the mirror's negative chromatic aberration compensates for that of the objective lens.

Career Highlights

Throughout his career, Degenhardt has worked with prestigious organizations such as Carl Zeiss Stiftung and U.S. Philips Corporation. His work in these companies has contributed to advancements in optical and imaging technologies.

Collaborations

Degenhardt has collaborated with notable professionals in his field, including Harald Rose and Dirk Preikszas. These collaborations have further enriched his contributions to electron beam technology.

Conclusion

Ralf Degenhardt's innovative work in electron beam technology and his patents reflect his expertise and dedication to advancing the field. His contributions continue to influence the development of imaging systems and spectrometric measurements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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