The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 1994
Filed:
Sep. 04, 1992
Carl-Zeiss-Stiftung, Heidenheim, DE;
Abstract
The invention relates to an imaging system for charged particles having a correction unit for correcting an objective lens. The correction unit essentially includes a beam deflector and a mirror which reflects the incoming particle beam. A first symmetry plane of the deflector is imaged in the mirror. The mirror images this first symmetry plane at an imaging scale of 1:1 in a second symmetry plane of the deflector. At the same time, the symmetry planes are either intermediate image planes or diffraction planes. With the high symmetry of the imaging system, the condition is achieved that the aberrations of the second order caused by a one-time passthrough through the deflector are cancelled after the second passthrough. The mirror can be so adjusted that its negative chromatic aberration compensates for the chromatic aberration of the objective lens and the other lenses. The spherical aberration can be compensated independently thereof with the aid of a hexapole which is centered in a diffraction plane.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile