Acton, MA, United States of America

Rakesh Kumar Singh

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Entegris, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rakesh Kumar Singh. Retrieved from https://idiyas.com/inventor/rakesh-kumar-singh-4lwrmpnf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Rakesh Kumar Singh: Innovator in Substrate Cleaning Technology

Introduction

Rakesh Kumar Singh is a notable inventor based in Acton, MA (US). He has made significant contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique cleaning brush that enhances efficiency in various applications.

Latest Patents

Rakesh holds 1 patent for his invention of a substrate cleaning brush. This invention is designed to improve the cleaning process in semiconductor manufacturing and other related industries.

Career Highlights

Rakesh Kumar Singh is currently employed at Entegris, Inc., a company known for its advanced materials and solutions for the semiconductor industry. His work at Entegris has allowed him to focus on developing innovative cleaning solutions that meet the industry's evolving needs.

Collaborations

Rakesh has collaborated with several talented individuals in his field, including Christopher J. Wargo and David Trio. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Rakesh Kumar Singh is a dedicated inventor whose work in substrate cleaning technology has made a significant impact in the industry. His contributions continue to drive innovation and improve processes in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…