Santa Clara, CA, United States of America

Rajneesh Jaiswal

This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rajneesh Jaiswal. Retrieved from https://idiyas.com/inventor/rajneesh-jaiswal-ahau0lel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Rajneesh Jaiswal

Introduction

Rajneesh Jaiswal, based in Santa Clara, California, is a prominent inventor with a noteworthy contribution to the field of semiconductor manufacturing. With one patent to his name, he has made strides in enhancing rapid thermal process (RTP) systems, which are critical for semiconductor fabrication.

Latest Patents

Rajneesh's patent, titled "Using refractory metal silicidation phase transition temperature points to control and/or calibrate RTP low temperature operation," outlines a method for controlling and calibrating rapid thermal process systems. In his patent, he describes a process where silicon semiconductor substrates with a refractory metal layer are subjected to silicidation in an RTP system at varying temperatures. The innovation focuses on measuring the sheet resistance uniformity of the wafers, which enables the detection of silicidation phase transition temperature points at their highest uniformity. These temperature points are crucial for calibrating the RTP systems, ensuring optimal performance and efficiency.

Career Highlights

Rajneesh Jaiswal works at Chartered Semiconductor Manufacturing Ltd, a corporation recognized for its expertise in providing semiconductor foundry services. Throughout his career, he has demonstrated a strong commitment to developing innovative techniques that improve semiconductor processing capabilities. His focus on precision and uniformity sets a standard in the rapidly evolving technology sector.

Collaborations

In his professional journey, Rajneesh has collaborated with esteemed colleagues, including Zhong Yun Zhu and Haznita Abd Karim. These collaborations foster an environment of innovation, allowing the team to tackle complex challenges in semiconductor manufacturing and drive advancements in the industry.

Conclusion

Rajneesh Jaiswal's contributions to semiconductor technology through his innovative patent illustrate the importance of precision in manufacturing processes. His work at Chartered Semiconductor Manufacturing Ltd and collaborative efforts with fellow professionals reflect his dedication to enhancing the efficiency and effectiveness of rapid thermal processes. As the semiconductor industry continues to evolve, inventors like Rajneesh will play a critical role in shaping its future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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