Rajinder P Khosla

Rajinder P Khosla is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Metal impurity neutralization within semiconductors by fluorination." This innovation utilizes fluorination to neutralize transition metal impurities in silicon. Fluorine is incorporated into the near-surface region of silicon through implantation or annealing in a fluorine-containing environment. Thermal treatments at appropriate temperatures initiate the interdiffusion and reaction between fluorine and metal contaminants. The impurities readily react with fluorine to form a compound or complex, significantly reducing the number of mid-gap impurities.

Another recent patent is for an "Image sensor adaptable for fast frame readout." This invention describes an area image sensor comprised of an array of photosites arranged in rows and columns. The sensor can be read in blocks of adjacent photosite rows, enabling operation at frame rates on the order of thousands of frames per second.

Career Highlights

Rajinder P Khosla is currently associated with Eastman Kodak Company, where he continues to innovate in the field of imaging and semiconductor technologies. His work has had a profound impact on the development of advanced imaging systems.

Collaborations

He has collaborated with notable colleagues such as Teh-Hsuang Lee and David L Heald, contributing to various projects that enhance the capabilities of imaging technologies.

Conclusion

Rajinder P Khosla's contributions to semiconductor technology and imaging systems demonstrate his innovative spirit and commitment to advancing the field. His patents reflect a deep understanding of material science and engineering, making him a valuable asset in the industry.