The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Apr. 29, 1996
Applicant:
Inventors:
Rajinder P Khosla, Ithaca, NY (US);
Liang-Sun Hung, Webster, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438471 ; 438473 ; 438477 ; 438528 ; 438795 ;
Abstract
Fluorination can be used to neutralize transition metal impurities in Si. Fluorine is incorporated into the near-surface region of Si by implantation or annealing in a fluorine containing ambient. Thermal treatments at appropriate temperatures are used to initiate the interdiffusion and reaction between fluorine and metal contaminants. The impurities readily react with fluorine to form a compound or complex, thus significantly reducing the number of mid-gap impurities.