This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 1994.
Company Filing History:
Years Active: 1994
Title: Innovations of Rajeev R Singh
Introduction
Rajeev R Singh is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on lithography techniques that enhance the efficiency of semiconductor manufacturing.
Latest Patents
Rajeev R Singh holds 1 patent for his invention titled "Lithography using a phase-shifting reticle with reduced transmittance." This patent describes a reticle and method for forming a patterned resist layer on a semiconductor substrate. The process involves coating the substrate with a resist layer and selectively exposing it to a radiation wave. The reticle consists of three areas with varying transmittance levels, allowing for precise control over the radiation phase and improving the quality of the patterned resist layer.
Career Highlights
Rajeev R Singh is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His role at Intel has allowed him to work on cutting-edge technologies that drive innovation in the industry. His expertise in lithography has positioned him as a valuable asset to the company.
Collaborations
Rajeev has collaborated with talented coworkers such as Giang T Dao and Kenny K Toh. These collaborations have fostered a creative environment that encourages the development of innovative solutions in semiconductor technology.
Conclusion
Rajeev R Singh's contributions to lithography and semiconductor technology highlight his role as an influential inventor. His patent and work at Intel Corporation demonstrate his commitment to advancing the field.