This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Synopsys, Inc.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Rainer Zimmermann: Innovator in Computational Lithography
Introduction
Rainer Zimmermann is a notable inventor based in Sauerlach, Germany. He has made significant contributions to the field of computational lithography, particularly through the integration of machine learning models. His innovative approach has the potential to enhance the accuracy and efficiency of lithographic processes.
Latest Patents
Rainer Zimmermann holds a patent for a process titled "Large scale computational lithography using machine learning models." This patent describes a computational lithography process that utilizes machine learning models to improve the accuracy of aerial images produced by lithographic masks. The process begins with a two-dimensional model of the lithographic mask, which generates a first aerial image. This image is then processed by a first machine learning model that infers a second aerial image. The first machine learning model is trained using a dataset that includes aerial images calculated with a more precise three-dimensional model. While the two-dimensional model is faster to compute, it lacks accuracy, which the machine learning model effectively mitigates. Rainer Zimmermann's patent represents a significant advancement in the field, with 1 patent to his name.
Career Highlights
Rainer Zimmermann is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys focuses on developing innovative solutions that leverage machine learning to enhance lithographic processes. His expertise in computational lithography has positioned him as a key player in the industry.
Collaborations
Rainer has collaborated with several talented individuals, including Dereje Shewaseged Woldeamanual and Thomas Heribert Mülders. These collaborations have contributed to the advancement of technologies in the field of lithography.
Conclusion
Rainer Zimmermann's contributions to computational lithography through his innovative patent demonstrate his commitment to advancing technology in this field. His work at Synopsys, Inc. and collaborations with other experts further highlight his impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
