Rainer Schramm

Title: Rainer Schramm: Innovator in Semiconductor Technology

Introduction

Rainer Schramm is a notable inventor based in Everett, MA (US), recognized for his contributions to semiconductor technology. With a total of 3 patents, Schramm has made significant advancements in the field, particularly in laser marking systems and wafer inspection methods.

Latest Patents

One of Schramm's latest patents is titled "System and method for inspecting wafers in a laser marking system." This patent discloses an illumination system designed for use in a semiconductor wafer backside inspection assembly. The system includes an illumination source that directs light toward a highly reflective surface at an angle of approximately 45 to 75 degrees.

Another significant patent is the "High speed, laser-based marking method and system for producing machine readable marks on workpieces and semiconductor devices with reduced subsurface damage produced thereby." This invention provides an improved method for laser marking semiconductor wafers, minimizing subsurface damage while enhancing marking speed. The method utilizes a pulsed laser beam with specific parameters to create machine-readable marks on the wafers.

Career Highlights

Rainer Schramm is currently employed at GSI Group Corporation, where he continues to innovate in the semiconductor industry. His work focuses on developing advanced technologies that improve the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Schramm has collaborated with notable colleagues, including Jonathan S. Ehrmann and Steven P. Cahill. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Rainer Schramm's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence advancements in laser marking and wafer inspection systems.