Dorsten, Germany

Rainer Leupers


Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 2007-2019

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9 patents (USPTO):Explore Patents

Title: Rainer Leupers: Innovator in System Level Modeling Simulation

Introduction

Rainer Leupers is a prominent inventor based in Dorsten, Germany. He has made significant contributions to the field of system level modeling simulation, holding a total of 9 patents. His work focuses on enhancing the efficiency and safety of multi-threaded simulations, which are crucial in modern computing environments.

Latest Patents

One of Rainer Leupers' latest patents is titled "Guarded memory access in a multi-thread safe system level modeling simulation." This patent outlines methods, systems, and machine-readable mediums for conducting multi-thread safe system level modeling simulations (SLMS) of a target system on a host system. An example of such a simulation is a SYSTEMC simulation. During the SLMS, processes are executed in parallel through multiple threads, representing the functional behaviors of components within the target system, including processor cores. The patent also discusses the use of deferred execution to manage operations that access shared resources, ensuring that memory access is safe and efficient.

Career Highlights

Rainer Leupers has worked with notable companies in the tech industry, including Synopsys, Inc. and Coware, Inc. His experience in these organizations has allowed him to develop and refine his innovative approaches to system level modeling.

Collaborations

Throughout his career, Rainer has collaborated with talented individuals such as Gunnar Braun and Andreas Hoffmann. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Rainer Leupers is a key figure in the realm of system level modeling simulation, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to influence the field and pave the way for future advancements in technology.

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