Hoehenkirchen, Germany

Rainer Florian Schnabel

USPTO Granted Patents = 10 


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 86(Granted Patents)


Location History:

  • Munich, DE (2001)
  • Höehenkirchen, DE (2002)
  • Höhenkirchen, DE (2004 - 2006)
  • Hoehenkirchen, DE (2002 - 2012)

Company Filing History:


Years Active: 2001-2012

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):

Title: Innovations of Rainer F. Schnabel in CVD/PVD Fill Process

Introduction: Rainer F. Schnabel is an influential inventor based in Höehenkirchen, Germany. With a focus on advanced filling techniques in semiconductor manufacturing, Schnabel has made significant contributions through his innovative patent.

Latest Patents: Rainer holds a patent for a unique method known as the CVD/PVD/CVD/PVD fill process. This method addresses the challenge of filling intermediate-sized structures effectively, eliminating voids during the fill process. The sequence of CVD (Chemical Vapor Deposition) and PVD (Physical Vapor Deposition) steps employed is particularly effective for enhancing the filling of "intermediate" size features commonly found in damascene and dual damascene structures.

Career Highlights: Schnabel's work has positioned him as a key figure in the field of semiconductor technology. His pioneering patent showcases his ability to innovate and address complex challenges in the industry. By contributing to improved manufacturing processes, he has enhanced the efficiency and reliability of semiconductor devices.

Collaborations: Throughout his career, Rainer has collaborated with notable professionals in the industry, including Larry Clevenger and Roy Charles Iggulden. These collaborations have likely facilitated the sharing of ideas and expertise, further driving innovation in semiconductor manufacturing techniques.

Conclusion: Rainer F. Schnabel's contributions to the field of semiconductor technology, particularly through his patented CVD/PVD fill process, highlight his role as a prominent inventor. His innovations are set to influence the efficiency of semiconductor filling processes and reflect his dedication to advancing the industry.

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