Company Filing History:
Years Active: 2013-2014
Title: Innovations of Raguraman Venkatesan
Introduction
Raguraman Venkatesan is an accomplished inventor based in Portland, OR. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and methodologies. With a focus on mask design and optical proximity correction (OPC), Venkatesan has been instrumental in advancing the technology used in device fabrication.
Latest Patents
Raguraman Venkatesan holds 2 patents related to mask design and OPC for device manufacture. His latest patents describe a comprehensive approach to mask design and modeling for a set of masks that are successively imaged to print a composite pattern on substrates, such as semiconductor wafers. The patents detail methods for double patterning a substrate with the set of masks, correcting drawn patterns based on predicted contours, and modeling resist profile contours for mask levels. These innovations are crucial for improving the accuracy and efficiency of semiconductor manufacturing processes.
Career Highlights
Venkatesan is currently employed at Intel Corporation, where he continues to push the boundaries of technology in semiconductor fabrication. His work has not only contributed to the advancement of manufacturing techniques but has also positioned him as a key player in the industry.
Collaborations
Throughout his career, Raguraman has collaborated with notable colleagues, including Shem Ogadhoh and Kevin J Hooker. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Raguraman Venkatesan's contributions to mask design and optical proximity correction have significantly impacted the semiconductor manufacturing industry. His innovative patents and collaborative efforts continue to drive advancements in technology.