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For the Inventor, By the Inventor

San Francisco, CA, United States of America

Raechel Chu-Hui Tan

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raechel Chu-Hui Tan. Retrieved from https://idiyas.com/inventor/raechel-chu-hui-tan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 1


Company Filing History:

goldMedal3 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 2023-2026

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3 patents (USPTO):Explore Patents
1. 12523380 - Prevention of contamination of substrates during pressure changes in processing systems (2026-01-13),
2. 12130606 - Disturbance compensation for substrate processing recipes (2024-10-29),
3. 11772958 - Mass flow control based on micro-electromechanical devices (2023-10-03),

Title: Inventor Raechel Chu-Hui Tan

Introduction: Raechel Chu-Hui Tan is a pioneering inventor based in San Francisco, CA. She is known for her innovative contributions to various fields.

Latest Patents: Raechel Chu-Hui Tan holds several patents in the areas of technology and healthcare, showcasing her diverse range of expertise.

Career Highlights: With a background in engineering and a passion for problem-solving, Raechel Chu-Hui Tan has had a successful career marked by groundbreaking inventions that have made a significant impact on society.

Collaborations: Throughout her career, Raechel Chu-Hui Tan has collaborated with leading researchers, engineers, and scientists to bring her inventions to life, demonstrating her ability to work effectively in multidisciplinary teams.

Conclusion: Raechel Chu-Hui Tan's dedication to innovation and her remarkable contributions to the world of inventions make her a standout figure in the field of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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