This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Mapper Lithography IP B.v.. Active years: 2013-2019.
Company Filing History:
Years Active: 2013-2019
Title: Rabah Hanfoug: Innovator in Charged Particle Beamlet Lithography
Introduction
Rabah Hanfoug is a notable inventor based in Gouda, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of charged particle beamlet systems. With a total of 2 patents to his name, Hanfoug's work is at the forefront of technological advancements in this area.
Latest Patents
Hanfoug's latest patents include a charged particle beamlet lithography system designed for transferring patterns to surfaces of targets. This innovative system features a sensor that determines various characteristics of charged particle beamlets. The sensor incorporates a converter element that receives charged particles and generates photons in response. The converter element's surface is equipped with multiple cells for evaluating individual beamlets, each designed with a predetermined blocking pattern of charged particle blocking structures. These structures create knife edges at transitions between blocking and non-blocking regions along a specific beamlet scan trajectory. The surface of the converter element is covered with a coating layer that is permeable to charged particles while being impermeable to ambient light. Additionally, an electrically conductive layer is situated between the coating layer and the blocking structures.
Career Highlights
Hanfoug is currently associated with Mapper Lithography IP B.V., where he continues to push the boundaries of lithography technology. His expertise in charged particle beamlet systems has positioned him as a key player in the industry.
Conclusion
Rabah Hanfoug's contributions to charged particle beamlet lithography exemplify the innovative spirit of modern inventors. His patents reflect a deep understanding of the complexities involved in lithography systems, paving the way for future advancements in the field.