This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: R Chris Burns: Innovator in Electron Beam Assisted Etching
Introduction
R Chris Burns is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes. His innovative approach has led to advancements that enhance the precision and efficiency of semiconductor manufacturing.
Latest Patents
R Chris Burns holds a patent for "Methods and apparatus for electron beam assisted etching at low temperatures." This patent discloses methods and apparatus for etching a sample, such as a semiconductor device or wafer. The invention allows for dry etching of materials, such as copper, at room temperature using a reactive substance, like a chlorine-based gas. The mechanisms of this invention enable precise etching to produce fine feature patterns without the need to heat the entire device or substrate to elevated temperatures. The etching process is enhanced by simultaneously scanning a charged particle beam, such as an electron beam, and a photon beam, like a laser beam, over the same target area while introducing the reactive substance. This innovative approach allows for effective etching of materials, such as copper layers, with high precision.
Career Highlights
R Chris Burns is currently associated with Kla Tencor Corporation, where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes. With a focus on low-temperature etching methods, he has contributed to the efficiency and effectiveness of the industry.
Collaborations
R Chris Burns has collaborated with talented individuals such as Ying Wang and Mehran Nasser-Ghodsi. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
R Chris Burns is a pioneering inventor whose work in electron beam assisted etching has made a significant impact on semiconductor technology. His innovative methods and collaborations continue to drive advancements in the industry.