Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Quan Cao
Introduction
Quan Cao is a notable inventor based in Shanghai, China. He has made significant contributions to the field of substrate processing, particularly through his innovative patent. His work is characterized by a focus on improving manufacturing processes in the semiconductor industry.
Latest Patents
Quan Cao holds a patent for a substrate processing method. This method involves several steps, including transferring a substrate plated with a first metal layer from a first plating chamber to a second plating chamber. After the transfer, a water film layer is formed on the front side of the substrate, followed by the electroplating of a second metal layer on the first metal layer. This innovative approach helps prevent delamination between the two metal layers and addresses issues related to product recess abnormalities. He has 1 patent to his name.
Career Highlights
Quan Cao is currently employed at Acm Research (Shanghai) Inc., where he continues to develop and refine his innovative techniques. His work at the company has positioned him as a key player in advancing substrate processing technologies.
Collaborations
He collaborates with talented coworkers, including Meng Wu and Chenhua Lu, who contribute to the innovative environment at Acm Research.
Conclusion
Quan Cao's contributions to substrate processing through his patented methods demonstrate his commitment to innovation in the semiconductor industry. His work not only enhances manufacturing processes but also addresses critical challenges in the field.