Location History:
- Newark, DE (US) (2002)
- Newport Beach, CA (US) (2002 - 2003)
- Newbury Park, CA (US) (2004)
Company Filing History:
Years Active: 2002-2004
Title: Innovations of Qiuliang Luo in Semiconductor Polishing
Introduction
Qiuliang Luo is a prominent inventor based in Newport Beach, CA (US). He has made significant contributions to the field of semiconductor polishing, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.
Latest Patents
Luo's latest patents include innovative methods and compositions for polishing semiconductor substrates. One of his notable inventions is a polishing composition that comprises abrasive particles and water of basic pH. This composition is designed to remove a barrier layer by chemical mechanical polishing (CMP) using a polishing pad. It further includes solely polar molecules that form hydrogen bonds with silanol bonding groups on a hydrated silica dielectric layer, creating a hydrophilic protective film that minimizes erosion.
Another significant patent is for an aqueous polishing composition specifically for chemical mechanical polishing of semiconductor devices made of silica and circuits of aluminum, titanium, or titanium nitride. This composition includes an oxidizing agent, a polyalkyleneimine inhibitor, and a pH buffer, along with a method for applying the polishing composition at the interface between a polishing pad and the semiconductor device.
Career Highlights
Qiuliang Luo is currently associated with Rodel Holdings, Inc., where he continues to develop innovative solutions for the semiconductor industry. His expertise in polishing technologies has positioned him as a key figure in advancing semiconductor manufacturing processes.
Collaborations
Luo has collaborated with notable colleagues such as James Shen and Peter A Burke, contributing to the development of cutting-edge polishing techniques and compositions.
Conclusion
Qiuliang Luo's contributions to semiconductor polishing through his innovative patents have significantly impacted the industry. His work continues to enhance the efficiency and effectiveness of semiconductor manufacturing processes.